The AW-1008 single-wafer photoresist asher is an automated tool designed as a flexible
downstream Microwave plasma photoresist removal system for high-volume wafer
fabrication. The AW-1008 is in direct
response to manufacturer’s concerns for wafer sensitivity to processing RF
damage, uptime, reliability and production-proven technology.
l Downstream
ashing for NO device damage
l Frontside
and backside isotropic removal
l Bulk
resist removal
l Single
wafer process
l High-dose
implanted resist
l Non-oxidizing
metal processing
l Descum
l Production-proven
plasma stripper/Asher system technology.
l 5-15%
Uniformity. (Process & Hardware dependent.
Optional.)
l Fast
strip/ash rate. (Process & Hardware dependent. Optional.)
l Increased
throughput with 3-Axis Integrated Robust Solid Robot.
l Frontside
and backside isotropic removal.
l 3x
1kW IR Lamp for uniform heating up to 500C.
l 75mm-150mm
wafer capability.
l Endpoint
detection w/Allwin21 SLOPE technology (Optional)
l 2
wafer sizes capability without hardware change if necessary.
l Two
Fixed cassette stations. Or, one Fixed
& one centering station.
l Can
handle 50um thickness wafer
l PC
controller with Advanced Allwin21 Software Package
l Up
to 4 gas lines with MFC’s
l 2.45GHz
1000W Microwave
l Pressure
control with Throttle Valve
l Touch
screen monitor
l EMO,
Interlocks, and Watchdog function
l GEM/SECS
II interface, Optional
l Small
Footprint
l Made
in U.S.A.
l Real
time graphics display, process data acquisition, and analysis.
l Closed-loop
process parameters control.
l Precise
parameters profiles tailored to suit specific process requirements.
l Programmable
comprehensive calibration of all subsystems from within the software. This allows faster, easier calibration,
leading to enhanced process results.
l Recipe
creation. It features a recipe editor to
create and edit recipes to fully automate the processing of wafers inside the
process chamber.
l Validation
of the recipe so improper control sequences will be revealed.
l Storage
of multiple recipes, process data and calibration files so that process and
calibration results can be maintained and compared over time.
l Passwords
provide security for the system, recipe editing, diagnostics, calibration and
setup functions
l Simple
and easy to use menu screen which allow a process cycle to be easily defined
and executed.
l Troubleshooting
features which allows engineers and service personnel to activate individual
subassemblies and functions. More I/O, AD/DA “exposure”.
l DB-25F
parallel (printer) port. The computer
interfaces to the Allwin21 system with only one cable: the control interface
cable.
l The
control board inside the machine that translates the computer commands to
control the machine has a watchdog timer.
If this board looses communication with the control software, it will
shut down all processes and halt the system until communication is restored.
l GEM/SECS
II function (Optional).
l Advanced
Allwin21 EOP function (Optional)
.
l Wafer
Size: 3 ,4,5,6 inch Capability. Multiple wafer size without hardware charge.
l Temperature:
150-350 ºC (±2 ºC) capability
l Gas
Lines: Up to four gas lines with MFCs. Popular MFC Range: 510 SLM O2 and 1
SLM N2.
l Asher
Rate: 1.5u-5u/min. positive photoresist; >8u/min. negative photoresist
l Uniformity:
15%, Process Dependent
l Particulate:
<0.05 /cm2 (0.03um or greater)
l Damage:
CV: <0.I V CV-shift for 250A gate oxide
l Selectivity:
>1000:1
l MTBF/MTTA/MTTR:
450 Hours/100 Hours/3.5 Hours or Better. 95% uptime
l *Contact
Allwin21 sales for other applications and specifications
l Main
Frame with Breakers, Relays and Wires
l Pentium
Class PC with AW Software
l Keyboard,
Mouse, USB with SW backup and Cables
l Quartz
Tray
n ①
3-4 inch; ②
4-6 inch; ③ 5 inch; ④
6 inch; ⑤ Others
l Fixed
Cassette Station
n ①
Two Cassette Stations; ②
One Cassette Station
l Lamp
Heat Module and Quartz Window (3 of 1000W IR lamp)
l 6
inch Quartz showerhead and 5 inch Diffusion Disk
l Chamber
Top Plate and Body with TC for Close Loop Temperature Control (CLTC)
l Main
Control, Distributor PCB and DC
l H1-7X10.5
Integrated Solid Robot
l Waveguide
and Quartz Plasma Tube
l Blower
for Magnetron and Waveguide
l Capacitor,
Two Transformers, HV Diode
l 1000W
Air cooling magnetron
l 1-4
Gas Lines w/ Pneumatic Valve, and MFC
n ①
One MFC; ② Two MFCs; ③
Three MFCs; ④ Four MFCs
l Main
Vacuum Valves. Two, one for Fast and one
for slow pump down
l MKS
Baratron
l Throttle
Valve
l Front
EMO, Interlocks
l 15-inch
Touch Screen GUI
l EOP
Module with PCB
l GEM/SECS
II function (Software)
l Lamp
Tower Alarm function
l 1.25kW
“Absolute” MW Magnetron with water-cooled Waveguide with AGL Power Generator.
l Vacuum
Pump
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